(Q39958754)
Statements
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Structural and Electrical Properties of EOT HfO2 (<1 nm) Grown on InAs by Atomic Layer Deposition and Its Thermal Stability (English)
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Yu-Seon Kang
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Hang-Kyu Kang
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Dae-Kyoung Kim
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Kwang-Sik Jeong
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Min Baik
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Youngseo An
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Hyoungsub Kim
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Jin-Dong Song
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Mann-Ho Cho
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1 March 2016
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7489-7498
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Identifiers
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