(Q120642345)

English

Pattern formation method using a photo mask for manufacturing a semiconductor device

US patent 11294286

Statements

Pattern formation method using a photo mask for manufacturing a semiconductor device (English)
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Ru-Gun Liu (Hsinchu County)
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Chin-Hsiang Lin (Hsinchu)
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Cheng-I Huang (Hsinchu)
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Chih-Ming Lai (Hsinchu)
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Chien-Wen Lai (Hsinchu)
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Ken-Hsien Hsieh (Taipei)
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Shih-Ming Chang (Hsinchu)
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Yuan-Te Hou (Hsinchu)
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27 February 2019
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5 April 2022
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