(Q37003777)
Statements
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X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth Measurement (English)
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Michael T Postek
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Jeremiah R Lowney
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Andras E Vladar
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William J Keery
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Egon Marx
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Robert D Larrabee
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1 July 1993
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415-445
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Identifiers
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