(Q38991547)
Statements
Effect of ion implantation energy for the synthesis of Ge nanocrystals in SiN films with HfO2/SiO2 stack tunnel dielectrics for memory application (English)
Bhabani Shankar Sahu
Florence Gloux
Marzia Carrada
Dominique Muller
Jesse Groenen
Caroline Bonafos
Sandrine Lhostis
28 February 2011
28 February 2011
1 reference
1 reference
1 reference