(Q44439666)
Statements
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In situ control of atomic-scale Si layer with huge strain in the nanoheterostructure NiSi/Si/NiSi through point contact reaction (English)
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Kuo-Chang Lu
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Wen-Wei Wu
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Han-Wei Wu
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Carey M Tanner
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Jane P Chang
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Lih J Chen
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K N Tu
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30 June 2007
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7
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8
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2389-2394
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Identifiers
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