(Q29399514)

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High-κ gate dielectrics: Current status and materials properties considerations

scientific article (publication date: 15 May 2001)

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High-κ gate dielectrics: Current status and materials properties considerations (English)

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G. D. Wilk

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1

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R. M. Wallace

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J. M. Anthony

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15 May 2001

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Journal of Applied Physics

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89

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10

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5243-5275

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Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications

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Crystalline Oxides on Silicon: The First Five Monolayers

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Impact of the vertical SOI 'DELTA' structure on planar device technology

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10.1063/1.1361065

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OpenCitations bibliographic resource ID

308942

OpenCitations bibliographic resource ID

308942

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(Q29399514)

High-κ gate dielectrics: Current status and materials properties considerations

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