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(Q57397993)

English

Properties of Oxide Film Atomic Layer Deposited from Tetraethoxy Silane, Hafnium Halides, and Water

scholarly article by Kaupo Kukli et al published 2004 in Journal of the Electrochemical Society

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title
Properties of Oxide Film Atomic Layer Deposited from Tetraethoxy Silane, Hafnium Halides, and Water (English)
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author
Kaupo Kukli
object named as
Kaupo Kukli
series ordinal
1
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Timo Sajavaara
object named as
Timo Sajavaara
series ordinal
4
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Mikko Ritala
object named as
Mikko Ritala
series ordinal
2
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Markku Leskela
object named as
Markku Leskelä
series ordinal
3
0 references
David Gilmer
series ordinal
7
object named as
David C. Gilmer
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Philip J. Tobin
series ordinal
8
object named as
Philip J. Tobin
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author name string
Juhani Keinonen
series ordinal
5
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Rama I. Hegde
series ordinal
6
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publication date
2004
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volume
151
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issue
5
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page(s)
F98
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Identifiers

DOI
10.1149/1.1668925
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