(Q57452017)

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The mechanism of Si etching in fluoride solutions

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scholarly article

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The mechanism of Si etching in fluoride solutions (English)

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Kurt W Kolasinski

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Kurt W. Kolasinski

1

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publication date

13 February 2003

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number of pages

9

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Physical Chemistry Chemical Physics

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5

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6

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1270-1278

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Identifiers

10.1039/B212108E

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