(Q58021507)

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Si0.85Ge0.15 oxynitridation in nitric oxide/nitrous oxide ambient

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Si0.85Ge0.15 oxynitridation in nitric oxide/nitrous oxide ambient (English)

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Anindya Dasgupta

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1

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Christos G. Takoudis

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2

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Yuanyuan Lei

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3

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Nigel D. Browning

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4

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publication date

July 2003

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published in

Journal of Applied Physics

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volume

94

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issue

1

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page(s)

716-719

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cites work

Practical aspects of atomic resolution imaging and analysis in STEM

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https://api.crossref.org/works/10.1063%2F1.1576489

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21 January 2018

Nitrogen bonding configurations at nitrided Si(001) surfaces andSi(001)−SiO2interfaces: A first-principles study of core-level shifts

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reference URL

https://api.crossref.org/works/10.1063%2F1.1576489

retrieved

21 January 2018

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DOI

10.1063/1.1576489

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(Q58021507)

Si0.85Ge0.15 oxynitridation in nitric oxide/nitrous oxide ambient

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