(Q58886087)

English

Al-Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

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Al-Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors (English)
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Gyu-Jin Choi
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Sang Young Lee
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Minha Seo
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Sang Woon Lee
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Jeong Hwan Han
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Hyo-Shin Ahn
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Seungwu Han
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21 April 2008
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20
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8
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1429-1435
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