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Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

scientific article (publication date: 15 June 2005)

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Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process (English)

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https://doi.org/10.1063%2F1.1940727

14 April 2017

1

Riikka L. Puurunen

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15 June 2005

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14 April 2017

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Journal of Applied Physics

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97

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12

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121301

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High-κ gate dielectrics: Current status and materials properties considerations

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22 May 2017

Atomic layer epitaxy - a valuable tool for nanotechnology?

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22 May 2017

Nomenclature of Organometallic Compounds of the Transition Elements (IUPAC Recommendations 1999)

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20 August 2023

https://opencitations.net/index/coci/api/v1/citations/10.1351/PAC199971081557

Surface Models for the Adsorption of a Calcium beta-Diketonate Complex on Calcium Sulfide

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31 May 2024

https://opencitations.net/index/api/v1/citations/10.3891/ACTA.CHEM.SCAND.50-0862

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10.1063/1.1940727

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Consolidated OpenCitations Corpus – April 2017

OpenCitations bibliographic resource ID

797411

OpenCitations bibliographic resource ID

797411

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Consolidated OpenCitations Corpus – April 2017

OpenCitations bibliographic resource ID

797411

ResearchGate publication ID

46141056

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(Q29393418)

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

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